AKTUELLE PARTNERANGEBOTE

Investigation on SiGe Selective Epitaxy for Source and Drain Engineering in 22 nm CMOS Technology Node and Beyond

Name: Investigation on SiGe Selective Epitaxy for Source and Drain Engineering in 22 nm CMOS Technology Node and Beyond
Brand: Springer
SKU: 4284815

Investigation on SiGe Selective Epitaxy for Source and Drain Engineering in 22 nm CMOS Technology Node and Beyond. Guilei Wang. Taschenbuch. Taschenbuch

1 Angebote · ab 106,99 € gemeldete Gesamtkosten

Gute Entscheidungen beginnen mit einem guten Vergleich.

Investigation on SiGe Selective Epitaxy for Source and Drain Engineering in 22 nm CMOS Technology Node and Beyond