AKTUELLE PARTNERANGEBOTE

Chemical-Mechanical Polishing of Low Dielectric Constant Polymers and Organosilicate Glasses: Fundamental Mechanisms And Application To Ic Interconnect Technology

Name: Chemical-Mechanical Polishing of Low Dielectric Constant Polymers and Organosilicate Glasses: Fundamental Mechanisms And Application To Ic Interconnect Technology
Brand: Borst, Christopher Lyle
SKU: 7032121

Brand : Springer, Binding : Taschenbuch, Edition : Softcover reprint of the original 1st ed. 2002, Label : Springer, Publisher : Springer, medium : Taschenbuch, numberOfPages : 248, publicationDate : 2014-02-23, releaseDate : 2014-02-23, authors : Borst, Christopher Lyle, ISBN : 1461354242

1 Angebote · ab 148,74 € gemeldete Gesamtkosten

Gute Entscheidungen beginnen mit einem guten Vergleich.

Chemical-Mechanical Polishing of Low Dielectric Constant Polymers and Organosilicate Glasses: Fundamental Mechanisms And Application To Ic Interconnect Technology